The conventional atomic force microscope (AFM) and critical-dimension atomic force microscope

(CD-AFM) probes are limited by the low effective scanning height of the tip, which prevents the accurate scanning

and imaging of deep trenches and large overhanging sidewall structures. Hence, a design and preparation scheme for

a new CD-AFM probe with a large-aspect-ratio tip structure is proposed herein. The developed CD-AFM probe has

an effective tip height of 5.1-5.8 μm and an aspect ratio of 14. The improved effective height is approximately four

times that of conventional silicon-based CD-AFM probes. Finally, the developed probe isevaluated using a deeptrench

sample with a nominal depth of 2.3 μm and an aspect ratio of 4.6.