2.7μm增透膜设计及工艺研究
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中国电子科技集团公司第二十六研究所, 重庆 400060

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周洋舟(1976-),女,重庆市人,高级工程师。

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Design and Process of 2.7 μm Diametry Film
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The 26th Institute of China Electronics Technology Group Corporation, Chongqing 400060 , China

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    摘要:

    针对2.7 μm声光Q开关的镀膜要求,介绍了2.7 μm增透膜的膜系设计、镀制工艺和性能测试情况。 2.7 μm增透膜选择铌酸锂晶体作为基体材料,氧化铪作为高折射率膜料,氟化镱作为低折射率膜料,采用4层窄带高透过率薄膜设计,制备出的样品透过率为98.6%,测试光波长为2.7 μm。样品经过48 h高低温实验、24 h丙酮无水乙醇等常用溶剂浸泡后,其性能依旧稳定。

    Abstract:

    This paper addresses the coating requirements for 2.7 μm acousto-optic Q-switches and details the de sign, fabrication process, and performance testing of 2.7 μm anti-reflective coatings. The substrate material for the 2.7 μm anti-reflective coating is lithium niobate crystal, with hafnium oxide selected as the high-refractive-index material and ytterbium fluoride as the low-refractive-index material. A four-layer narrowband high-transmittance film design was employed in this study. The resulting samples exhibited a transmittance of 98.6% at a wavelength of 2.7 μm. The coated samples maintained their stable performance after 48 h of high and low-temperature experi ments and 24 h of immersion in common solvents such as acetone and anhydrous ethanol.

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周洋舟,张泽红,何晓亮,谢强.2.7μm增透膜设计及工艺研究[J].压电与声光,2024,46(6):990-994. ZHOU Yangzhou, ZHANG Zehong, HE Xiaoliang, XIE Qiang. Design and Process of 2.7 μm Diametry Film[J]. PIEZOELECTRICS AND ACOUSTOOPTICS

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  • 收稿日期:2024-06-25
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  • 在线发布日期: 2023-11-06
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