A transmission deformable lens structure with large aperture, small deformation, and high precision is proposed to solve the problem of low-order aberration of the objective lens of a deep ultraviolet (DUV) lithogra phy machine following a period of operation.The correction performance of the deformable lens was simulated via finite element analysis, and the number of actuators, thickness of the glass, and width of the inner and outer rings were deter mined. The simulation results show that the normalized residual error is less than 0.2% when reconstructing the Zernike aberration of Z3-Z9 terms. The overall correction of the object image error of 193 nm DUV lithography machine is satis fied. Moreover, the effects of gravity field and thermal absorption on lens aberrations were studied, and it was found that both have the largest defocus aberration but small values, which can be corrected using deformable lens.